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Dicing & Grinding Tapes for High Temperature
Anti-static, controlled peel strength tapes for up to 300°C intermittent use |
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AIT
Product
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Adhesion Strength
(Peel, gm/in)
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Adhesive
Thickness
(Micron)
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Liner Material
Thickness
(Micron)
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Elongation
(%)
Expandability
[ ]
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Tensile Strength
(Kg/cm)
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HTCR 250
(Single-Sided)
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250
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25
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75
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>100
[Good]
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>200
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HTCR 500
(Single-Sided)
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500
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25
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75
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>100
[Good]
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>200
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HTCR 250-DS
(Double-Sided)
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250
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25
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75
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>100
[Good]
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>200
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HTCR 500-DS
(Double-Sided)
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500
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25
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75
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>100
[Good]
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>200
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UV Activated Release Dicing-Grinding Tapes
(BASIC PRODUCT PROPERTIES)
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AIT
Product
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Adhesion Before UV Exposure
(Peel, gm/in)
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Adhesion After UV Exposure
(Peel, gm/in)
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Adhesive
Thickness
(Micron)
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Liner Material
Thickness
(Micron)
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Elongation
(%) Expandability
[ ]
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Tensile Strength
(Kg/cm)
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Special Characteristics
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UVR 250
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250
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10
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25
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75
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>100
[Good]
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>200
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§ Withstand 100°C continuous usage
§ Silicone-Free
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NOTES:
Ø Other thickness may be made to special order.
Ø All of the stretchable films based are proprietary technology, high temperature stable, and non-silicone flexible thermosetting resins.
Ø Some of the adhesive may tolerate strong acid etchant.
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Melt-Bonding Wafer-Substrate Dicing-Grinding Film
(BASIC PRODUCT PROPERTIES)
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AIT
Product
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Push-Off Strength
(Die-Shear, psi)
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Max. Load Bearing Temp. (°C)
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“Melt-Bonding” Temperature & Lamination Process
(@14-15psi)
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CB7060
(Single ply melt-bonding adhesive film)
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>1,000
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60
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§ >70°C with heated roll laminator with proper “foam” support
§ >70°C with “vacuum bagging”
§ Low ionic and ease of total removal
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CB7130
(Single ply melt-bonding adhesive film)
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>1,000
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130
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§ >130°C with heated roll laminator with proper “foam” support
§ >130°C with “vacuum bagging”
§ Low ionic and ease of total removal
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CB7350-S
(High-tack single-sided adhesive film on a temperature stable liner)
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>300
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150
(Continuous & 300 @5 min.)
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§ Mount wafer-substrate with suitable laminator or with “vacuum bagging” equipment
§ Low ionic and ease of total removal with suitable solvent
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CB7350-B
(High-tack double-sided adhesive film on a temperature stable liner)
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>300
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150
(Continuous & 300 @5 min.)
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§ Mount wafer-substrate with suitable laminator or with “vacuum bagging” equipment
§ Low ionic and ease of total removal with suitable solvent
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Wafer-Substrate Part Removal-Cleaning
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§ Parts may be removed at temperature same or higher than the lamination temperatures of 70°C for CB7065 and 130°C for CB7135. Follow by suitable solvents (Please consult AIT engineering assistance) for complete dissolution cleaning.
§ Proprietary cleaning solvent is used to remove diced parts for TK7355. Part-on-liner may be placed on a suitable wire-rack and soaked in solvent bath sequence for complete dissolution and cleaning of adhesive residue
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CB7065
(Thermally conductive, single ply melt-bonding adhesive film)
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>1,000
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60
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§ >70°C with heated roll laminator with proper “foam” support
§ >70°C with “vacuum bagging”
§ Low ionic and ease of total removal
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CB7135
(Thermally conductive, single ply melt-bonding adhesive film)
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>1,000
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130
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§ >130°C with heated roll laminator with proper “foam” support
§ >130°C with “vacuum bagging”
§ Low ionic and ease of total removal
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TK7355-SS
(High-tack single-sided adhesive film on a high thermal conductivity film liner)
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>300
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150
(Continuous & 300 @5 min.)
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§ Mount wafer-substrate with suitable laminator or with “vacuum bagging” equipment
§ Low ionic and ease of total removal with suitable solvent
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